METHOD FOR MAKING A THIN FILM USING PRESSURE SIZING

摘要

The invention concerns a method for making a thin film from a solid material substrate (1) having a planar surface (2) which consists in: implanting gaseous species in the substrate (1) to form a layer of microcavities located at a depth relative to said planar surface (2) corresponding to the desired thickness for the film, the gaseous species being implanted in conditions capable of embrittling the substrate at the layer of microcavities; partially or completely separating the thin film from the rest of the substrate (1), said separation comprising a step which consists in supplying thermal energy and applying pressure on said planar surface (2).