首页> 外国专利> Device structure for providing improved Schottky barrier rectifier

Device structure for providing improved Schottky barrier rectifier

机译:提供改进的肖特基势垒整流器的装置结构

摘要

This invention discloses a Schottky barrier rectifier formed in a semiconductor chip of a first conductivity type having a cathode electrode connected thereto near a bottom surface of the semiconductor chip. The Schottky rectifier further includes an epitaxial layer of the first conductivity type of a reduced doping concentration than the semiconductor chip near a top surface of the semiconductor chip. The Schottky rectifier further includes a high resistivity region disposed near peripheral edges of the semiconductor chip containing a reduced dopant concentration than the epitaxial layer. The Schottky rectifier further includes an anode electrode defined by a conductive layer disposed on top over the epitaxial layer wherein the conductive layer having all peripheral edges disposed on top of the high resistivity region. In a preferred embodiment, e.g., the rectifier further includes a barrier height reduction region disposed below the anode electrode disposed at a distance away from the high resistivity region. The barrier height reduction region containing a higher dopant concentration than the epitaxial layer for reducing the barrier height and for reducing a forward resistance of the Schottky rectifier.
机译:本发明公开了一种在第一导电类型的半导体芯片中形成的肖特基势垒整流器,在该半导体芯片的底表面附近具有连接至其的阴极电极。肖特基整流器还包括第一导电类型的外延层,该第一导电类型的外延层的掺杂浓度比半导体芯片的顶表面附近的半导体芯片的掺杂浓度低。肖特基整流器还包括高电阻率区域,该高电阻率区域设置在半导体芯片的外围边缘附近,该半导体芯片的外围边缘具有比外延层低的掺杂剂浓度。肖特基整流器还包括由设置在外延层上方的顶部上的导电层限定的阳极电极,其中该导电层的所有外围边缘均位于高电阻率区域的顶部上。在优选实施例中,例如,整流器还包括设置在阳极电极下方的势垒高度减小区域,该势垒高度减小区域设置在与高电阻率区域相距一定距离处。势垒高度减小区域包含比外延层更高的掺杂剂浓度,以减小势垒高度并减小肖特基整流器的正向电阻。

著录项

  • 公开/公告号US6184563B1

    专利类型

  • 公开/公告日2001-02-06

    原文格式PDF

  • 申请/专利权人 YU HO-YUAN;

    申请/专利号US19990362928

  • 发明设计人 YU HO-YUAN;

    申请日1999-07-27

  • 分类号H01L27/095;H01L29/47;H01L29/812;H01L31/07;H01L31/108;

  • 国家 US

  • 入库时间 2022-08-22 01:05:22

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号