首页> 外国专利> Dichloro tetraflouro-amp;lcub;2,2amp;rcub;-paracyclopane, a process for manufacturing thereof and poly-amp;agr;, amp;agr;-difluoro-chloro-para-xylylene film prepared therefrom

Dichloro tetraflouro-amp;lcub;2,2amp;rcub;-paracyclopane, a process for manufacturing thereof and poly-amp;agr;, amp;agr;-difluoro-chloro-para-xylylene film prepared therefrom

机译:二氯四氟-,2,2-对环环烷,其制备方法和由此制备的聚,α-二氟-氯-对二甲苯膜

摘要

Dichloro-tetrafluoro-[2,2]-paracyclophane (formula I), which is a novel compound useful as a material for forming a coating film by chemical vapor deposition, and a process for manufacturing thereof and poly-&agr;&agr;-difluoro-chloro-para-xylylene film prepared therefrom are disclosed. Dichloro-tetrafluoro-[2,2]-paracyclophane is manufactured by chlorinating tetrafluoro-[2,2]-paracyclophane. The film to be formed by chemical vapor deposition of dichloro-tetrafluoro-[2,2]-paracyclophane has remarkably improved thermostability, as compared with the conventional products and is expected to be applied in various fields.
机译:二氯四氟-1,2,2-对环环烷(式I),是一种新型化合物,可用作通过化学气相沉积形成涂膜的材料,及其制备方法和聚-a-公开了由此制备的二氟-氯-对亚二甲苯膜。二氯-四氟-2,2-对环环烷是通过氯化四氟-2,2-对环环烷而制得的。与常规产品相比,通过化学气相沉积二氯-四氟-1、2,2和-对环环烷形成的膜具有显着改善的热稳定性,并有望应用于各种领域。

著录项

  • 公开/公告号US6194620B1

    专利类型

  • 公开/公告日2001-02-27

    原文格式PDF

  • 申请/专利权人 DAISAN KASEI KABUSHIKI KAISHA;

    申请/专利号US19970789012

  • 发明设计人 HIROSHI MARUYAMA;

    申请日1997-01-27

  • 分类号C07C190/80;C07C220/00;C08G732/40;

  • 国家 US

  • 入库时间 2022-08-22 01:04:59

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