Polycrystalline AZO thin films with preferential texture in the (002) direction, electrical resistivitybelow 2 mΩcm and visible optical transmission above 85 % have been prepared by both DC and MF sputtering fromceramic oxide target in argon atmosphere. The input power was varied between 600 and 1500 W, that allowed torange the growth rate between 50 and 130 nm/min, whereas the deposition time was adjusted accordingly to obtain～2.0 μm thick layers at the different powers and modes. The evolution of the AZO film optical and electricalcharacteristics after exposure to damp heat environment (85 °C and 85 % relative humidity) has been analyzed as afunction of the treatment time for the layers prepared at the different sputtering conditions. After more than 1000 h ofdamp heat exposition, the analyzed samples showed an increase in the electrical resistance ～15-20 % of the initialvalue. No degradation of the optical transmittance has been detected except for the layers prepared at the highestpower values in continuous DC mode. Such layers showed the strongest (002) texture and became milky and rougherafter the damp heat treatment.
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