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Amplitude mask, and apparatus and method for manufacturing long period grating filter using the same

机译:振幅掩模以及使用该掩模的长周期光栅滤波器的制造装置和方法

摘要

An amplitude mask, and an apparatus and method for manufacturing a long period grating filter using the same, are provided. When a long period grating is manufactured by selectively passing laser light to an optical fiber, the amplitude mask periodically passes laser light to the optical fiber. The amplitude mask includes two masks having periodically alternating pass areas for passing the laser light and nonpass areas for preventing passing of the laser light, the two masks being continuously rotated in opposite directions. The period of the pass area thus continuously changes. In this mask, two masks each having a predetermined period are rotated in opposite directions, to thus provide an amplitude mask period depending on the angle of rotation. Thus, the period of the amplitude mask can be continuously changed.
机译:提供了一种振幅掩模以及使用该掩模制造长周期光栅滤波器的设备和方法。当通过将激光选择性地传递到光纤来制造长周期光栅时,振幅掩模周期性地将激光传递到光纤。振幅掩模包括两个掩模,两个掩模具有周期性交替的通过激光的通过区域和用于防止激光通过的非通过区域,这两个掩模沿相反的方向连续旋转。通过区域的周期因此连续变化。在该掩模中,每个具有预定周期的两个掩模沿相反的方向旋转,从而根据旋转角度提供振幅掩模周期。因此,振幅掩模的周期可以连续改变。

著录项

  • 公开/公告号US6204969B1

    专利类型

  • 公开/公告日2001-03-20

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO. LTD.;

    申请/专利号US19980207584

  • 发明设计人 JOO-NYUNG JANG;

    申请日1998-12-08

  • 分类号G02B63/40;G02B51/80;

  • 国家 US

  • 入库时间 2022-08-22 01:04:51

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