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Absorption layer to minimize substrate exposure during UV writing of waveguide grating in addition to birefringence control system
Absorption layer to minimize substrate exposure during UV writing of waveguide grating in addition to birefringence control system
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机译:除双折射控制系统外,吸收层可最大程度地减少波导光栅紫外线写入过程中的基板暴露
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摘要
A waveguide having photosensitive properties is disclosed comprising: a waveguide substrate; a first cladding layer formed on the waveguide substrate; a UV absorbing layer formed on the first cladding layer; a UV sensitive layer having optical transmission properties adapted to be changed with UV irradiation, the layer formed on or closely adjacent the UV absorbing layer; and a second cladding layer, being substantially UV transparent, on the UV sensitive layer. Preferably, there is further provided a third cladding layer intermediate of the UV absorbing layer and the UV sensitive layer. The UV absorbing layer comprises a germanosilicate material. The absorbing layer can be adapted to change a physical property upon UV absorption. The UV absorbing layer can be variable thickness, the thickness being in accordance with predetermined requirements.
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