首页> 外国专利> Absorption layer to minimize substrate exposure during UV writing of waveguide grating in addition to birefringence control system

Absorption layer to minimize substrate exposure during UV writing of waveguide grating in addition to birefringence control system

机译:除双折射控制系统外,吸收层可最大程度地减少波导光栅紫外线写入过程中的基板暴露

摘要

A waveguide having photosensitive properties is disclosed comprising: a waveguide substrate; a first cladding layer formed on the waveguide substrate; a UV absorbing layer formed on the first cladding layer; a UV sensitive layer having optical transmission properties adapted to be changed with UV irradiation, the layer formed on or closely adjacent the UV absorbing layer; and a second cladding layer, being substantially UV transparent, on the UV sensitive layer. Preferably, there is further provided a third cladding layer intermediate of the UV absorbing layer and the UV sensitive layer. The UV absorbing layer comprises a germanosilicate material. The absorbing layer can be adapted to change a physical property upon UV absorption. The UV absorbing layer can be variable thickness, the thickness being in accordance with predetermined requirements.
机译:公开了一种具有光敏特性的波导,包括:波导基板;在波导基板上形成第一覆层;在第一覆层上形成的紫外线吸收层;具有适于随紫外线照射而改变的光透射性质的紫外线敏感层,该层形成在紫外线吸收层上或紧邻紫外线吸收层;在紫外线敏感层上基本上是紫外线透明的第二覆层。优选地,进一步在紫外线吸收层和紫外线敏感层之间提供第三覆层。紫外线吸收层包括锗硅酸盐材料。吸收层可以适于在吸收紫外线时改变物理性质。紫外线吸收层可以是可变的厚度,该厚度符合预定要求。

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