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Absorbing layer for minimizing substrate exposure during the UV writing of a waveguide grating in addition to a birefringent control system
Absorbing layer for minimizing substrate exposure during the UV writing of a waveguide grating in addition to a birefringent control system
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机译:除双折射控制系统外,用于在波导光栅的紫外线写入过程中使基板暴露最小化的吸收层
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摘要
A waveguide having photosensitive properties is disclosed comprising: a waveguide substrate; a first cladding layer formed on the waveguide substrate; a UV absorbing layer formed on the first cladding layer; a UV sensitive layer having optical transmission properties adapted to be changed with UV irradiation, the layer formed on or closely adjacent the UV absorbing layer; and a second cladding layer, being substantially UV transparent, on the UV sensitive layer. Preferably, there is further provided a third cladding layer intermediate of the UV absorbing layer and the UV sensitive layer. The UV absorbing layer comprises a germanosilicate material. The absorbing layer can be adapted to change a physical property upon UV absorption. The UV absorbing layer can be variable thickness, the thickness being in accordance with predetermined requirements.
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