首页> 外国专利> Absorbing layer for minimizing substrate exposure during the UV writing of a waveguide grating in addition to a birefringent control system

Absorbing layer for minimizing substrate exposure during the UV writing of a waveguide grating in addition to a birefringent control system

机译:除双折射控制系统外,用于在波导光栅的紫外线写入过程中使基板暴露最小化的吸收层

摘要

A waveguide having photosensitive properties is disclosed comprising: a waveguide substrate; a first cladding layer formed on the waveguide substrate; a UV absorbing layer formed on the first cladding layer; a UV sensitive layer having optical transmission properties adapted to be changed with UV irradiation, the layer formed on or closely adjacent the UV absorbing layer; and a second cladding layer, being substantially UV transparent, on the UV sensitive layer. Preferably, there is further provided a third cladding layer intermediate of the UV absorbing layer and the UV sensitive layer. The UV absorbing layer comprises a germanosilicate material. The absorbing layer can be adapted to change a physical property upon UV absorption. The UV absorbing layer can be variable thickness, the thickness being in accordance with predetermined requirements.
机译:公开了一种具有光敏特性的波导,包括:波导基板;在波导基板上形成第一覆层;在第一覆层上形成的紫外线吸收层;具有适于随紫外线照射而改变的光透射性质的紫外线敏感层,该层形成在紫外线吸收层上或紧邻紫外线吸收层;在紫外线敏感层上基本上是紫外线透明的第二覆层。优选地,进一步在紫外线吸收层和紫外线敏感层之间提供第三覆层。紫外线吸收层包括锗硅酸盐材料。吸收层可以适于在吸收紫外线时改变物理性质。紫外线吸收层可以是可变的厚度,该厚度符合预定要求。

著录项

  • 公开/公告号US6529668B1

    专利类型

  • 公开/公告日2003-03-04

    原文格式PDF

  • 申请/专利权人 THE UNIVERSITY OF SYDNEY;

    申请/专利号US20010700328

  • 发明设计人 JOHN CANNING;

    申请日2001-02-01

  • 分类号G02B61/00;

  • 国家 US

  • 入库时间 2022-08-22 00:04:12

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