UV-Writing of a Superstructure Waveguide Bragg Grating in a Planar Polymer Substrate

摘要

We report on the fabrication of a superstructure Bragg grating in a planar polymer substrate. Based on a twofold illumination process an integrated waveguide and a superstructure Bragg grating are subsequently written into bulk polymethylmethacrylate by UV-induced refractive index modification. The measured reflected spectrum of the superstructure Bragg grating exhibits multiple reflection peaks and is in good agreement with performed standard simulations based on the beam propagation method and coupled mode theory algorithms. By applying a varying tensile load we determine the strain sensitivity to be about 1.10 pm/µε and demonstrate the applicability of the superstructure Bragg grating for strain measurements with redundant sensing signals.