首页> 外国专利> APPARATUS AND METHOD FOR MANUFACTURING SUBSTRATE WASHING WATER, SUBSTRATE WASHING WATER MANUFACTURED BY THE SAME, AND METHOD FOR WASHING SUBSTRATE BY USING SUBSTRATE WASHING WATER

APPARATUS AND METHOD FOR MANUFACTURING SUBSTRATE WASHING WATER, SUBSTRATE WASHING WATER MANUFACTURED BY THE SAME, AND METHOD FOR WASHING SUBSTRATE BY USING SUBSTRATE WASHING WATER

机译:制造基质洗涤水的装置和方法,由其制造的基质洗涤水以及使用基质洗涤水洗涤基质的方法

摘要

PROBLEM TO BE SOLVED: To provide an apparatus for manufacturing electrolytically ionized water which can manufacture electrolytically ionized water with which a semiconductor substrate or the like can be washed at a low cost, easily and harmlessly. SOLUTION: An aqueous electrolytic solution 2 filled in an electrolytic cell 1 is divided into an anolyte 2a and a catholyte 2b by a diaphragm 6 to which consists of a porous neutral film and through which water can freely flow. Particularly a cathode electrode 5 among electrodes to be used is provided with proper holes (2 to 4 mm in diamter and the total of the areas of the holes is specified to an effective opening area of 5 to 55% of the area of an electrode plate), by which the electrolyte can freely move between the front and rear of the electrode, and the electrolyte dissolved to saturated concentration in an anode electrode 4 and the cathode electrode 5 is easily exchanged with a dissolved solution of low concentration. Dissolution of gases into the electrolyte and generation of ions are efficiently performed, and consequently, negative pole reduced water is obtained at the cathode side.
机译:解决的问题:提供一种用于制造电解电离水的设备,该设备可以制造能够以低成本,容易且无害地洗涤半导体衬底等的电解电离水。解决方案:填充到电解池1中的含水电解质溶液2通过隔膜6分为阳极电解液2a和阴极电解液2b,隔膜6由多孔中性膜组成,水可以自由流动通过隔膜6。特别地,要使用的电极中的阴极电极5设置有适当的孔(直径为2至4mm,并且孔的总面积规定为电极板的面积的5至55%的有效开口面积)。 ),电解质可以在电极的前后之间自由移动,并且在阳极电极4和阴极电极5中溶解至饱和浓度的电解质容易与低浓度的溶解溶液交换。有效地将气体溶解到电解质中并产生离子,因此,在阴极侧获得了负极还原的水。

著录项

  • 公开/公告号JP2002224674A

    专利类型

  • 公开/公告日2002-08-13

    原文格式PDF

  • 申请/专利权人 TAKIO TEC:KK;

    申请/专利号JP20010336074

  • 发明设计人 KITADA ATSUSHI;KONO SUNAO;

    申请日1996-10-21

  • 分类号C02F1/46;B08B3/08;C25B1/06;C25B9/00;C25B9/08;C25B11/03;

  • 国家 JP

  • 入库时间 2022-08-22 00:59:55

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