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APPARATUS FOR PRODUCTION OF SUBSTRATE WASHING WATER, PRODUCTION THEREOF, SUBSTRATE WASHING WATER PRODUCED BY THE SAME AND METHOD FOR WASHING SUBSTRATE BY USING THE SUBSTRATE WASHING WATER
APPARATUS FOR PRODUCTION OF SUBSTRATE WASHING WATER, PRODUCTION THEREOF, SUBSTRATE WASHING WATER PRODUCED BY THE SAME AND METHOD FOR WASHING SUBSTRATE BY USING THE SUBSTRATE WASHING WATER
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机译:用于生产基质洗涤水的设备,其生产方法,由其生产的基质洗涤水以及使用该基质洗涤水洗涤基质的方法
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摘要
PROBLEM TO BE SOLVED: To provide an apparatus for producing electrolytically ionized water capable of producing the electrolytically ionized water which can easily wash semiconductor substrates, etc., without pollution at a low cost. ;SOLUTION: An aq. electrolytic soln. 2 filled in an electrolytic cell 1 is divided to an anolyte 2a and a catholyte 2b by a diaphragm 6 which consists of a porous neutral membrane and through which water can freely flow. Particularly a cathode electrode 5 of the electrodes to be used is provided with suitable holes (2 to 4 mm in diameter and the total of the areas of the holes is specified to an effective opening area of 5 to 55% of the area of the electrode plate), by which the electrolyte is made to move freely between the front and rear of the electrode and the electrolyte dissolved to a saturation concn. at the anode electrode 4 and the cathode electrode 5 is easily exchanged with the dissolved liquid of a low concn. The dissolution of the gas into the electrolyte and the generation of ions are efficiently effected and in consequence thereof the negative pole reduced water is obtd. on the cathode side.;COPYRIGHT: (C)1999,JPO
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