Is produced by circuit pattern body production manner, or the exposure device and its exposure device which use exposure manner and its exposure manner the circuit pattern body

摘要

PURPOSE:To eliminate that an image is blurred or the like even when an aligner is shaken wholly or locally by a method wherein a detection means which detects the vibration or the structural deformation of the aligner is installed in a part in which the vibration or the deformation is caused and the timing of an exposure operation is controlled on the basis of its detection signal. CONSTITUTION:Individual signals from seven sensors S1 to S7 installed in parts causing a dislocation is a pattern image projected on a wafer 3 out of vibration parts or structural deformation parts inside a stepper are input to a computer 25 for image-displacement analysis. The individual sensors S1 to S7 are arranged as one example. The computer 25 for image-displacement analysis computes, in a real-time manner, the relative position-shift characteristic between an image to be projected on the wafer 3 by means of a projection lens 2 and a shooting region on the wafer 3 from the comprehensive inter-relation of the signals from the individual sensors. An exposure operation to the shooting region is started or suspended on the basis of the position-shift characteristic and the positioning characteristic of a wafer stage 5 or on the basis of the settling characteristic of the wafer stage 5.