The target which is produced the manner which produces the NiSi magnetron sputtering target by the said manner

摘要

(57) Abstract Topic Adding silicon to the nickel, it makes the paramagnetic alloy, magnetron sputtering efficiency is large when due to this alloy, at the same time sputtering on the silicon substrate the target which is produced the manner which produces the sputtering target which does not bring the introduction of the impurity by the said manner is offered. SolutionsAforementioned manner, the melting silicon of the sufficient tonnage blending the melting nickel, from the said blend, includes the step which it tries to be able to cast the alloy to which just the tonnage above approximately 4.5wt% includes silicon. It is desirable, forming the casting ingot with rolling, it produces the board of necessary thickness.