It consists of the target material null precious metal or the precious alloy which for precious metal sputtering is produced by the production manner and its manner

摘要

PROBLEM TO BE SOLVED: To provide a method capable of easily producing a target material of noble metal or a noble metal alloy having a change of thickness capable of corresponding to its partial consumption at the time of sputtering and to produce a noble metal target material for sputtering produced by the method. ;SOLUTION: As for the method of producing a target material for sputtering in which the thickness of a consumed region high in a sputtering rate has a change of thickness higher than that of the other region, a cathode and an anode are dipped into a noble metal salt- containing solution in a confronted state, and the noble metal salt-containing solution is electrolyzed in a state in which the current density at the position almost corresponding to the above consumed region in the cathode is higher than that of the position almost corresponding to the other region to precipitate noble metal or a noble metal alloy, where, as the method of controlling the current density in the cathode, the one in which the anode is formed in such a manner that the distance between the anode and the cathode in the position almost corresponding to the consumed region is made smaller than that in the position almost corresponding to the other region, and the electrolysis is executed and the one in which a shielding board having an opening part with a shape and an area almost equal to that of the consumed region is arranged proximately to the cathode, and the electrolysis is executed, are preferable.;COPYRIGHT: (C)2001,JPO