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METHOD FOR MANUFACTURING LOW REFLECTIVE SUBSTRATE, LOW REFLECTIVE SUBSTRATE, TRANSPARENT ELECTRODE SUBSTRATE AND RESISTANCE FILM TYPE TRANSPARENT TOUCH PANEL
METHOD FOR MANUFACTURING LOW REFLECTIVE SUBSTRATE, LOW REFLECTIVE SUBSTRATE, TRANSPARENT ELECTRODE SUBSTRATE AND RESISTANCE FILM TYPE TRANSPARENT TOUCH PANEL
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机译:制造低反射率基板,低反射率基板,透明电极基板和电阻膜式透明触摸屏的方法
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摘要
PROBLEM TO BE SOLVED: To form an antireflection layer, having a low refractive index on the surface of a substrate and to provide a low reflective substrate, having high transmittance for visible rays by the method of supersaturation precipitation that the substrate is brought into contact with a silicon oxide supersaturated aqueous solution of hydrosilicofluoric acid to precipitate a silicon dioxide film on the substrate surface.;SOLUTION: In the method for manufacturing the low reflective substrate, by specifying film-forming rate of the silicon dioxide film to 20 to 100 nm/h in the process of forming a silicon dioxide film by the method of supersaturation precipitation, so as to control the fluorine content in the silicon dioxide film and to form an antireflection film having ≤1.435 of refractive index. The low reflective substrate is manufactured by the above method, a transparent electrode film is formed on the low reflective substrate to obtain a transparent electrode substrate, and the transparent electrode substrate is used for a resistance film type transparent touch panel.;COPYRIGHT: (C)2002,JPO
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