首页> 外国专利> PHOTOPOLYMERIZABLE COMPOSITION FOR NEAR INFRARED LASER EXPOSURE AND PHOTOPOLYMERIZABLE PLANOGRAPHIC PRINTING PLATE

PHOTOPOLYMERIZABLE COMPOSITION FOR NEAR INFRARED LASER EXPOSURE AND PHOTOPOLYMERIZABLE PLANOGRAPHIC PRINTING PLATE

机译:近红外激光照射的光聚合组成和可光聚合的平板印刷版

摘要

PROBLEM TO BE SOLVED: To provide a photopolymerizable composition for near infrared laser exposure excellent in preservability, and a photopolymerizable planographic printing plate. SOLUTION: The photopolymerizable composition contains (A) an ethylenic monomer, (B) a photopolymerization initiating system which generates a radical in the light of 700-1,300 nm wavelength and (C) an amine compound having an atomic group [-N-CH2-] in its molecule. The photopolymerizable planographic printing plate is obtained by coating the top of a base with the photopolymerizable composition.
机译:解决的问题:提供用于保存性优异的近红外激光曝光用的光聚合性组合物和光聚合性平版印刷版。解决方案:可光聚合的组合物包含(A)烯键式单体,(B)在700-1,300 nm波长的光下产生自由基的光聚合引发体系,以及(C)具有原子团[-N-CH2- ]在其分子中。可光聚合平版印刷版是通过用可光聚合组合物涂覆基底的顶部而获得的。

著录项

  • 公开/公告号JP2002202592A

    专利类型

  • 公开/公告日2002-07-19

    原文格式PDF

  • 申请/专利权人 MITSUBISHI CHEMICALS CORP;

    申请/专利号JP20010075248

  • 发明设计人 TSURUYA YASUYUKI;TOSHIMITSU ERIKO;

    申请日2001-03-16

  • 分类号G03F7/004;B41N1/14;G03F7/00;G03F7/029;

  • 国家 JP

  • 入库时间 2022-08-22 00:58:24

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号