首页> 外国专利> PHOTOPOLYMERIZABLE COMPOSITION FOR NEAR INFRARED LASER EXPOSURE, PHOTOPOLYMERIZABLE PLANOGRAPHIC PRINTING PLATE AND METHOD FOR PRODUCING PRINTING PLATE

PHOTOPOLYMERIZABLE COMPOSITION FOR NEAR INFRARED LASER EXPOSURE, PHOTOPOLYMERIZABLE PLANOGRAPHIC PRINTING PLATE AND METHOD FOR PRODUCING PRINTING PLATE

机译:近红外激光曝光的光聚合组成,可光聚合的平板印刷印版及其制备方法

摘要

PROBLEM TO BE SOLVED: To provide a photopolymerizable composition for a near infrared laser having high sensitivity and excellent in visible image forming property.;SOLUTION: In the photopolymerizable composition for near infrared laser exposure containing (A) an ethylenically unsaturated compound, (B) a cyanine sensitizing dye and/or a phthalocyanine sensitizing dye having a structure with heterocycles bonded through a polymethine chain and (C) a compound containing an organic boron anion and/or a halomethyl group, (D) 1-3 wt.% coloring dye having the absorption maximum at 450-650 nm is contained.;COPYRIGHT: (C)2002,JPO
机译:解决的问题:提供一种具有高灵敏度和优异的可见图像形成性能的用于近红外激光的光聚合组合物;解决方案:在用于近红外激光曝光的光聚合组合物中,其包含(A)烯键式不饱和化合物,(B)具有通过聚次甲基链键合有杂环的结构的花菁增感染料和/或酞菁增感染料,以及(C)含有有机硼阴离子和/或卤代甲基的化合物,(D)1-3重量%的着色染料含有在450-650 nm处具有最大吸收的化合物。;版权:(C)2002,JPO

著录项

  • 公开/公告号JP2002072466A

    专利类型

  • 公开/公告日2002-03-12

    原文格式PDF

  • 申请/专利权人 MITSUBISHI CHEMICALS CORP;

    申请/专利号JP20000368413

  • 发明设计人 URANO TOSHIYOSHI;TSURUYA YASUYUKI;

    申请日2000-12-04

  • 分类号G03F7/004;C08F2/50;G03F7/00;G03F7/027;G03F7/029;

  • 国家 JP

  • 入库时间 2022-08-22 00:59:21

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