首页> 外国专利> METHOD FOR MANUFACTURING P-TYPE GALLIUM NITRIDE COMPOUND SEMICONDUCTOR, METHOD FOR MANUFACTURING GALLIUM NITRIDE COMPOUND SEMICONDUCTOR LIGHT EMITTING ELEMENT AND GALLIUM NITRIDE COMPOUND SEMICONDUCTOR LIGHT EMITTING ELEMENT

METHOD FOR MANUFACTURING P-TYPE GALLIUM NITRIDE COMPOUND SEMICONDUCTOR, METHOD FOR MANUFACTURING GALLIUM NITRIDE COMPOUND SEMICONDUCTOR LIGHT EMITTING ELEMENT AND GALLIUM NITRIDE COMPOUND SEMICONDUCTOR LIGHT EMITTING ELEMENT

机译:制造p型氮化镓复合半导体发光元件的方法,制造氮化镓复合半导体发光元件的方法和氮化镓复合半导体发光元件

摘要

PROBLEM TO BE SOLVED: To enable p-type conduction without deterioration of a crystal of a light emitting layer and without contamination at a low cost and realize a good ohmic contact with an electrode.;SOLUTION: A method for manufacturing a p-type gallium nitride compound semiconductor comprises a first step of manufacturing a gallium nitride compound semiconductor layer 3 in which a p-type impurity is added, a second step of manufacturing a catalytic layer 7 made of a metal or the like on the layer 3, and a third step of heat treating the layer 3 in a state in which the layer 7 is attached.;COPYRIGHT: (C)2002,JPO
机译:解决的问题:在不降低发光层的晶体质量且不造成污染的情况下,以低成本实现p型导通,并实现与电极的良好欧姆接触。解决方案:制造p型镓的方法氮化物化合物半导体包括制造在其中添加有p型杂质的氮化镓化合物半导体层3的第一步骤,在层3上制造由金属等制成的催化层7的第二步骤以及第三步骤。层3附着状态下对层3进行热处理的步骤;版权所有:(C)2002,JPO

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号