首页> 外国专利> DISCONNECTION TYPE WAFER LIFT FOR CVD TREATMENT CHAMBER AND FIVE-SHAFT ADJUSTABLE HEATER LIFT SYSTEM

DISCONNECTION TYPE WAFER LIFT FOR CVD TREATMENT CHAMBER AND FIVE-SHAFT ADJUSTABLE HEATER LIFT SYSTEM

机译:CVD处理室和五轴可调节加热器提升系统的分离式晶片提升器

摘要

PROBLEM TO BE SOLVED: To provide a disconnection type wafer lift for CVD treatment chambers, and to provide a heater lift system.;SOLUTION: The disconnection type lift system comprises a heater lift 104 and a wafer lift 106. The heater lift 104 includes a clamp block 103 having an integrated clamp deflection arm, and a yoke 105 having a clamp screw and a clamp surface. The yoke 105 is inserted into the block 103. The wafer lift 106 includes a lift hoop 110 having keys, a lift pin that is essentially at a right angle to the hoop, and a bellows shaft 108 having keys. The lift hoop 110 having keys and bellows shaft 108 having keys are connected by one clamp screw. A method for using the separation type lift system for treating a substrate is also provided.;COPYRIGHT: (C)2002,JPO
机译:解决的问题:提供用于CVD处理室的断开式晶片升降机,并提供加热器升降系统。解决方案:断开式升降机系统包括加热器升降机104和晶片升降机106。加热器升降机104包括具有一体的夹具偏转臂的夹具块103,以及具有夹具螺钉和夹具表面的轭架105。轭105被插入到块103中。晶片升降机106包括具有钥匙的升降箍110,与该箍基本上成直角的升降销以及具有钥匙的波纹管轴108。具有一个键的升降机箍110和具有多个键的波纹管轴108通过一个夹紧螺钉连接。还提供了一种使用分离式提升系统处理基材的方法。;版权所有:(C)2002,JPO

著录项

  • 公开/公告号JP2002237464A

    专利类型

  • 公开/公告日2002-08-23

    原文格式PDF

  • 申请/专利权人 APPLIED MATERIALS INC;

    申请/专利号JP20010328941

  • 发明设计人 KEITH K KOAI;SCHIEVE ERIC W;

    申请日2001-10-26

  • 分类号H01L21/205;C23C16/44;H01L21/68;

  • 国家 JP

  • 入库时间 2022-08-22 00:57:19

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