首页>
外国专利>
DISCONNECTION TYPE WAFER LIFT FOR CVD TREATMENT CHAMBER AND FIVE-SHAFT ADJUSTABLE HEATER LIFT SYSTEM
DISCONNECTION TYPE WAFER LIFT FOR CVD TREATMENT CHAMBER AND FIVE-SHAFT ADJUSTABLE HEATER LIFT SYSTEM
展开▼
机译:CVD处理室和五轴可调节加热器提升系统的分离式晶片提升器
展开▼
页面导航
摘要
著录项
相似文献
摘要
PROBLEM TO BE SOLVED: To provide a disconnection type wafer lift for CVD treatment chambers, and to provide a heater lift system.;SOLUTION: The disconnection type lift system comprises a heater lift 104 and a wafer lift 106. The heater lift 104 includes a clamp block 103 having an integrated clamp deflection arm, and a yoke 105 having a clamp screw and a clamp surface. The yoke 105 is inserted into the block 103. The wafer lift 106 includes a lift hoop 110 having keys, a lift pin that is essentially at a right angle to the hoop, and a bellows shaft 108 having keys. The lift hoop 110 having keys and bellows shaft 108 having keys are connected by one clamp screw. A method for using the separation type lift system for treating a substrate is also provided.;COPYRIGHT: (C)2002,JPO
展开▼