DEVICE AND METHOD FOR GENERATING CORRECTION TABLE, DEVICE AND METHOD FOR GENERATING MASK PATTERN FOR CORRECTION TABLE, DEVICE AND METHOD FOR GENERATING MASK PATTERN FOR FINE WORKING, AND METHOD FOR FORMING FINE WORKING PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a correction table generating device and method for accurately correcting a process proximity effect by a rule base, a device and a method for generating a mask pattern for a correction table, a device and a method for generating a mask pattern for fine working, and a method for forming a fine working pattern.;SOLUTION: Gate line width for a sample is measured and gate line width A most close to target line width T and the gate pattern line width B of a mask for a corresponding correction table are found out for each pattern shape using space between the gate line width and a pattern as a parameter (S2). A correction value (a) for biasing the gate pattern of the fine working mask is calculated from a difference between the gate line width A and the target line width T (S3), an additional correction value (b) is calculated from the difference between the gate line width A and the target line width T while considering an MEF calculated for each pattern shape (S4) and a final correction value (c) is calculated for each pattern shape by adding the additional correction value (b) to the correction value (a) (S5).;COPYRIGHT: (C)2002,JPO