MOLECULAR FILM PATTERN FORMING METHOD, MOLECULAR FILM PATTERN, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, METHOD FOR PRODUCING OPTOELECTRONIC DEVICE, OPTOELECTRONIC DEVICE, METHOD FOR PRODUCING ELECTRONIC DEVICE AND ELECTRONIC APPLIANCE

摘要

PROBLEM TO BE SOLVED: To solve the problem that a simple patterning using UV is possible for a molecular film having various functional groups formed on a substrate, however, further shortening of patterning time is expected.;SOLUTION: The molecular film pattern forming method includes a step for forming a molecular film of 3 nm thickness on the surface of a substrate with an organosilicon compound having a chemical structure of formula (1) (where Ar is a divalent aromatic group) as part of its molecular structure as a material and a step for irradiating the molecular film with light.;COPYRIGHT: (C)2002,JPO