METHOD FOR ANALYZING MINUTE FOREIGN MATTER, ANALYSIS APPARATUS, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND LIQUID CRYSTAL DISPLAY DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method and an apparatus whereby a position of a minute foreign matter on a sample surface is detected again on an analysis apparatus efficiently and highly accurately without damaging a light-receiving device when the minute foreign matter is analyzed with the use of a foreign matter- inspecting apparatus and the analysis apparatus.;SOLUTION: There is provided a position detection process in the analysis apparatus in which the position on the sample surface of the minute foreign matter is detected again on the analysis apparatus 10. The position detection process includes a combination selection process for estimating a signal strength at the light-receiving device with the use of size information or scattering light intensity information of the minute foreign matter obtained by the foreign matter-inspecting apparatus 30 and, selecting a combination of an intensity of a beam light 23 and a gain of the light-receiving device 5.;COPYRIGHT: (C)2002,JPO