首页> 外国专利> SKIN CARE PREPARATION FOR AMELIORATING AND PREVENTING NONALLERGIC CHAPPED SKIN AND SKIN CARE PREPARATION FOR AMELIORATING AND PREVENTING PIMPLE

SKIN CARE PREPARATION FOR AMELIORATING AND PREVENTING NONALLERGIC CHAPPED SKIN AND SKIN CARE PREPARATION FOR AMELIORATING AND PREVENTING PIMPLE

机译:改善和预防非正常性皮肤破裂的皮肤护理以及预防和预防人的皮肤护理

摘要

PROBLEM TO BE SOLVED: To obtain a skin care preparation for ameliorating and preventing nonallergic chapped skin and an agent for ameliorating and preventing nonallergic chapped skin, having ameliorating and preventing effect on nonallergic chapped skin and rough skin caused by drying, a detergent, etc., and an agent for ameliorating and preventing pimple and a skin care preparation for ameliorating and preventing pimple, promoting recovery of pimple and having ameliorating and preventing effect on pimple and rash.;SOLUTION: This skin care preparation comprises ethylenediaminedisuccinic acid or its salt.;COPYRIGHT: (C)2002,JPO
机译:要解决的问题:获得用于改善和预防非过敏性皮肤干裂的皮肤护理制剂和用于预防和防止非过敏性皮肤干裂的皮肤的制剂,该制剂对干燥引起的非过敏性皮肤干裂和粗糙的皮肤具有改善和预防作用,使用去污剂等。 ;解决方案:该皮肤护理制剂包含乙二胺二丁二酸或其盐。该皮肤护理制剂包含乙二胺二琥珀酸或其盐。版权:(C)2002,日本特许厅

著录项

  • 公开/公告号JP2002212045A

    专利类型

  • 公开/公告日2002-07-31

    原文格式PDF

  • 申请/专利权人 SHISEIDO CO LTD;

    申请/专利号JP20010008816

  • 发明设计人 KATSUTA YUJI;NANBA TOMIYUKI;

    申请日2001-01-17

  • 分类号A61K7/48;A61K7/00;A61K31/197;A61P17/10;A61P17/16;

  • 国家 JP

  • 入库时间 2022-08-22 00:56:28

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