首页> 外国专利> ANALYZING METHOD OF CHARGE DISTRIBUTION, ANALYZING METHOD OF ELECTROMAGNETIC FIELD, CHARGED PARTICLE OPTICAL SYSTEM, DESIGNING METHOD FOR IT, AND CHARGED PARTICLE BEAM DEVICE

ANALYZING METHOD OF CHARGE DISTRIBUTION, ANALYZING METHOD OF ELECTROMAGNETIC FIELD, CHARGED PARTICLE OPTICAL SYSTEM, DESIGNING METHOD FOR IT, AND CHARGED PARTICLE BEAM DEVICE

机译:电荷分布的分析方法,电磁场的分析方法,带电粒子光学系统,其设计方法以及带电粒子束装置

摘要

PROBLEM TO BE SOLVED: To provide an analyzing method of charge distribution as well as analyzing method of potential distribution which accurately analyzes charge distribution and potential distribution at a material to which charged particle beam or electromagnetic wave is projected, and analyzing method of electromagnetic field, charged particle optical system, designing method for it, and charged particle beam device.;SOLUTION: When analyzing charge distribution or potential distribution of a material to which charged particle beam or electromagnetic wave is projected, movement of charged particles is tracked by combining a Monte Carlo method and a method for resolving a diffusion equation of charged particles.;COPYRIGHT: (C)2002,JPO
机译:要解决的问题:提供一种电荷分布的分析方法以及电势分布的分析方法,可以准确地分析投射有带电粒子束或电磁波的材料上的电荷分布和电势分布,以及电磁场的分析方法,带电粒子光学系统,其设计方法和带电粒子束装置。;解决方案:在分析投射有带电粒子束或电磁波的材料的电荷分布或电势分布时,通过组合Monte跟踪带电粒子的运动卡洛方法和带电粒子扩散方程的求解方法。;版权:(C)2002,JPO

著录项

  • 公开/公告号JP2002216699A

    专利类型

  • 公开/公告日2002-08-02

    原文格式PDF

  • 申请/专利权人 EBARA CORP;

    申请/专利号JP20010007719

  • 发明设计人 KANEMATSU ERIKA;

    申请日2001-01-16

  • 分类号H01J37/29;H01L21/027;H01L21/66;

  • 国家 JP

  • 入库时间 2022-08-22 00:55:28

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