PLASMA DENSITY INFORMATION MEASURING METHOD AND ITS EQUIPMENT, AND PROBE FOR PLASMA DENSITY INFORMATION MEASUREMENT, PLASMA PROCESSING METHOD AND ITS EQUIPMENT

摘要

PROBLEM TO BE SOLVED: To measure plasma density information with sufficient accuracy according to various plasma generating conditions.;SOLUTION: Observing easily absorbing points according to various plasma generating conditions can measure the plasma density information, such as electron density with sufficient accuracy, by choosing measurement probes 5 (measurement probe 5a, 5b, 5c, and so forth) according to plasma generating conditions by a measurement probe changing part 8a, while providing two or more measurement probe 5a, 5b, 5c, and so forth, which have different dielectric constants of tubes mutually in a chamber 1. Based on the measurement result of the plasma density information, plasma processing of etching or the like is easily and appropriately controlled by an electric power control part 4 for generation. Especially, constituting the tube from substances having 15 or more of dielectric constant ratios, can observe absorption points having strong absorption.;COPYRIGHT: (C)2002,JPO