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METHOD OF EVALUATING HEAT TREATING EFFECT AND METHOD OF EVALUATING RESIST BAKING APPARATUS
METHOD OF EVALUATING HEAT TREATING EFFECT AND METHOD OF EVALUATING RESIST BAKING APPARATUS
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机译:热处理效果的评估方法和电阻烘烤装置的评估方法
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摘要
PROBLEM TO BE SOLVED: To provide a method of evaluating a heat treating effect by which the heat treating effect which a resist film receives actually through the whole of a baking step can be actualized and can be appropriately evaluated and to provide a method of evaluating a baking apparatus.;SOLUTION: On a resist baking temperature-residual film rate curve, a region A in which the relation between the residual film rate and baking temperature of a resist film subjected to excessive film reduction treatment is represented by a steep and linear slope is present, and the dispersion in heat treating effect can be actualized as dispersion in residual film rate by using the region A as a working curve, and the heat treating effect which the resist film receives actually through the whole of a baking step can be appropriately evaluated.;COPYRIGHT: (C)2002,JPO
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