MULTILAYER FILM REFLECTION MIRROR AND CONTROL METHOD FOR WAVE ABERRATION OF THE MULTILAYER FILM REFLECTION MIRROR

摘要

PROBLEM TO BE SOLVED: To provide a multilayer film reflection mirror capable of improving fabrication accuracy by minimizing the fabrication unit in the technique for correcting the surface shape of a multilayer mirror by removing the surface layer of the multilayer film.;SOLUTION: The multilayer reflection mirror is constituted by forming on a substrate, a film structure including at least a periodical structure layering by turns a first layer group consisting of at least one or more kinds of material layer having a large difference between refractive index in soft X-ray region and that in vacuum, and a second layer group consisting of at least one or more kinds of material layer having the small difference. The layer can be ground off by the unit of a layer of each material layer constituting the first layer group. By thinning the layer as a fabrication unit, the accuracy of wave aberration could be improved.;COPYRIGHT: (C)2002,JPO