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50-nm-resolution full-field X-ray microscope without chromatic aberration using total-reflection imaging mirrors

机译:使用全反射成像镜的无色差的50纳米分辨率全视野X射线显微镜

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摘要

X-ray spectromicroscopy with a full-field imaging technique is a powerful method for chemical analysis of heterogeneous complex materials with a nano-scale spatial resolution. For imaging optics, an X-ray reflective optical system has excellent capabilities with highly efficient, achromatic, and long-working-distance properties. An advanced Kirkpatrick–Baez geometry that combines four independent mirrors with elliptic and hyperbolic shapes in both horizontal and vertical directions was developed for this purpose, although the complexity of the system has a limited applicable range. Here, we present an optical system consisting of two monolithic imaging mirrors. Elliptic and hyperbolic shapes were formed on a single substrate to achieve both high resolution and sufficient stability. The mirrors were finished with a ~1-nm shape accuracy using elastic emission machining. The performance was tested at SPring-8 with a photon energy of approximately 10 keV. We could clearly resolve 50-nm features in a Siemens star without chromatic aberration and with high stability over 20 h. We applied this system to X-ray absorption fine structure spectromicroscopy and identified elements and chemical states in specimens of zinc and tungsten micron-size particles.
机译:具有全场成像技术的X射线光谱显微镜是一种用于化学分析具有纳米级空间分辨率的异质复杂材料的有效方法。对于成像光学器件,X射线反射光学系统具有出色的功能,具有高效,消色差和长工作距离的特性。为此,尽管系统的复杂性适用范围有限,但仍开发了先进的柯克帕特里克·贝兹(Kirkpatrick-Baez)几何形状,该几何形状在水平和垂直方向上都结合了四个椭圆和双曲线形状的独立反射镜。在这里,我们介绍了一个由两个单片成像镜组成的光学系统。椭圆和双曲线形状形成在单个基板上,以实现高分辨率和足够的稳定性。使用弹性发射加工以约1 nm的形状精度对镜子进行精加工。性能是在SPring-8上以大约10 keV的光子能量测试的。我们可以清楚地分辨出西门子星中的50 nm特性,而没有色差,并且在20 h内具有很高的稳定性。我们将此系统应用于X射线吸收精细结构光谱学,并鉴定了锌和钨微米级颗粒样品中的元素和化学状态。

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