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METHOD OF FORMING LASER CIRCUIT HAVING LOW PENETRATION OHMIC CONTACT PROVIDING IMPURITY GETTERING AND THE RESULTANT LASER CIRCUIT

机译:具有低穿透性,欧姆接触并提供杂质吸收的激光电路的形成方法及结果激光电路

摘要

PROBLEM TO BE SOLVED: To prevent the migration of impurities to the active area of a semiconductor device during the formation of a contact structure.;SOLUTION: During the formation of the contact structure which is formed by forming a thin layer of a pure metal on a semiconductor cap layer, the thin metal layer is caused to react with the cap layer, and the migration of impurities to the active area of the semiconductor device is prevented by trapping mobile impurities and self-interstitials diffusing within the cap layer and in nearby metal layers in the resulting reacted layer. The level of integration of a semiconductor optoelectronic device is improved by the semiconductor cap layer, such as an InGaAs cap layer having a thickness of ≤200 nm together with the pure metal layer and, in addition, fewer impurities are introduced in the formation of an ohmic contact than with prior art alloy contacts.;COPYRIGHT: (C)2002,JPO
机译:解决的问题:在形成接触结构的过程中,防止杂质迁移到半导体器件的有源区。解决方案:在形成接触结构的过程中,通过在其上形成纯金属薄层来形成接触结构在半导体盖层中,使金属薄层与盖层发生反应,并且通过将移动杂质和自填隙子扩散到盖层内和附近的金属中,从而防止杂质迁移到半导体器件的有源区所得反应层中的有机层。通过半导体覆盖层(例如厚度为200 nm的InGaAs覆盖层)和纯金属层,可以提高半导体光电子器件的集成度,此外,在形成铝纳米管时引入较少的杂质。欧姆接触比现有技术的合金接触要好。;版权所有:(C)2002,日本特许厅

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