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Self-aligned fabrication technique for tri-tone attenuated phase-shifting masks
Self-aligned fabrication technique for tri-tone attenuated phase-shifting masks
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机译:三音衰减相移掩模的自对准制造技术
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摘要
A structure and method are provided to ensure self-aligned fabrication of a tri-tone attenuated phase-shifting mask. A sub-resolution, 0 degree phase, greater than 90% transmission rim is provided along the edge of an opaque region. The alignment of this sub-resolution rim with the opaque and attenuated regions of the mask is performed in a single patterning step. In one embodiment, a narrow opaque region can be replaced by a sub-resolution, 0 degree phase, greater than 90% transmission line.
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