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Method and apparatus for reducing incidental exposure by using a phase shifter with a variable regulator
Method and apparatus for reducing incidental exposure by using a phase shifter with a variable regulator
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机译:通过使用带有可变调节器的移相器来减少偶然曝光的方法和设备
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摘要
One embodiment of the invention provides a system for reducing incidental exposure caused by phase shifting during fabrication of a semiconductor chip. The system operates by identifying a problem area of likely incidental exposure in close proximity to an existing phase shifter on a phase shifting mask, wherein the problem area includes a polysilicon line passing through a field region of the semiconductor chip. The system places an additional phase shifter into the problem area on the phase shifting mask so that a regulator within the additional phase shifter protects the polysilicon line passing through the field region. This additional phase shifter has a wider regulator than the existing phase shifter, wherein the existing phase shifter is used to expose a polysilicon line in a gate region of the semiconductor chip.
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