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Method for correcting an optical proximity effect in an interconnect pattern by shortening the legs of cutout patterns to avoid linewidth reduction
Method for correcting an optical proximity effect in an interconnect pattern by shortening the legs of cutout patterns to avoid linewidth reduction
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机译:通过缩短切口图案的支脚以避免线宽减小来校正互连图案中的光学邻近效应的方法
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摘要
A method for correcting an optical proximity effect in an exposure process includes the step of extracting corner portions of a mask interconnect pattern, providing a default “L”-shaped cutout correction pattern on the inner corner of the extracted corner portion, extracting a “]”-shaped pattern including a pair of corner portions in proximity, adjusting the distance of the opposing ends of the default cutout correction patterns in the “]”-shaped pattern to have a specified space. The method prevents the width of the straight portion of the “]”-shaped pattern of the resultant interconnect from being made smaller than the design width.
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