首页> 外国专利> Pellicle frame and static bonding method for temporary and permanent attachment of pellicle frame to photomask substrate

Pellicle frame and static bonding method for temporary and permanent attachment of pellicle frame to photomask substrate

机译:用于暂时和永久地将防护膜框架固定到光掩模基板上的防护膜框架和静态粘合方法

摘要

A method and apparatus for temporarily attaching a pellicle membrane and frame to a photomask substrate until the assembly passes inspection, and then permanently bonding the frame to the substrate. In the preferred embodiment, a vacuum channel is provided in the pellicle frame to permit a vacuum to be drawn between the frame and the substrate. In alternate embodiments, a static adhesion is obtained between the flat surfaces of the pellicle frame and the substrate, and this static adhesion is improved by wiping a solvent on the bottom surface of the pellicle frame.
机译:一种方法和设备,用于将防护膜和框架临时连接到光掩模基板上,直到组件通过检查,然后将框架永久地粘合到基板上。在优选实施例中,在防护薄膜组件框架中提供了真空通道,以允许在框架和基底之间抽真空。在替代实施例中,在防护薄膜组件框架的平坦表面与基板之间获得静态粘附,并且通过在防护薄膜组件框架的底表面上擦拭溶剂来改善这种静态粘附。

著录项

  • 公开/公告号US6406573B1

    专利类型

  • 公开/公告日2002-06-18

    原文格式PDF

  • 申请/专利权人 CERIO MARK DANIAN;

    申请/专利号US20000544316

  • 发明设计人 MARK DANIAN CERIO;

    申请日2000-04-06

  • 分类号B32B311/40;

  • 国家 US

  • 入库时间 2022-08-22 00:48:58

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