Pellicle frame, photomask and manufacturing method of pellicle frame

摘要

The pellicle frame in one aspect of the present disclosure comprises a first surface and a second surface provided on both sides in the thickness direction, an inner peripheral surface and an outer peripheral surface connected to the first and second surfaces, and has a rectangular shape having four corners and four sides in plan view.This pellicle frame has at least a pair of opposing sides of the opposing pair of sides, at least the opposite thicknesses of the opposing pair of sides, or greater than the respective thicknesses of the corners at both sides of the opposing pair of sides The minimum thickness of each pair of opposing sides is smaller than the respective thicknesses of the corners on both sides of each opposing pair of sides.