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Magnetic lens apparatus for use in high-resolution scanning electron microscopes and lithographic processes

机译:用于高分辨率扫描电子显微镜和光刻工艺的磁透镜设备

摘要

Disclosed are lens apparatus in which a beam of charged particles is brought to a focus by means of a magnetic field, the lens being situated behind the target position. In illustrative embodiments, a lens apparatus is employed in a scanning electron microscope as the sole lens for high-resolution focusing of an electron beam, and in particular, an electron beam having an accelerating voltage of from about 10 to about 30,000 V. In one embodiment, the lens apparatus comprises an electrically-conducting coil arranged around the axis of the beam and a magnetic pole piece extending along the axis of the beam at least within the space surrounded by the coil. In other embodiments, the lens apparatus comprises a magnetic dipole or virtual magnetic monopole fabricated from a variety of materials, including permanent magnets, superconducting coils, and magnetizable spheres and needles contained within an energy-conducting coil. Multiple-array lens apparatus are also disclosed for simultaneous and/or consecutive imaging of multiple images on single or multiple specimens. The invention further provides apparatus, methods, and devices useful in focusing charged particle beams for lithographic processes.
机译:公开了一种透镜装置,其中,带电粒子束通过磁场聚焦,该透镜位于目标位置的后面。在说明性实施例中,透镜装置在扫描电子显微镜中用作唯一透镜,用于高分辨率聚焦电子束,特别是具有约10至约30,000 V加速电压的电子束。在一个实施例中,透镜设备包括围绕光束的轴线布置的导电线圈和至少在由线圈围绕的空间内沿着光束的轴线延伸的磁极靴。在其他实施例中,透镜设备包括由多种材料制成的磁偶极子或虚拟磁单极子,包括永磁体,超导线圈以及可磁化的球体和包含在能量传导线圈中的针。还公开了用于在单个或多个样本上同时和/或连续成像多个图像的多阵列透镜设备。本发明进一步提供了用于聚焦带电粒子束以进行光刻工艺的设备,方法和装置。

著录项

  • 公开/公告号US6410923B1

    专利类型

  • 公开/公告日2002-06-25

    原文格式PDF

  • 申请/专利权人 ARCH DEVELOPMENT CORPORATION;

    申请/专利号US20000550945

  • 发明设计人 ALBERT V. CREWE;

    申请日2000-04-17

  • 分类号H01J371/43;H01J372/80;

  • 国家 US

  • 入库时间 2022-08-22 00:48:14

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