首页> 外国专利> METHOD AND APPARATUS FOR MANUFACTURING MAGNETORESISTIVE ELEMENT, SOFTWARE AND SYSTEM FOR CONTROLLING MANUFACTURING OF MAGNETORESISTIVE ELEMENT, SOFTWARE FOR ESTIMATING RESISTANCE VALUE OF MAGNETORESISTIVE ELEMENT, AND COMPUTER SYSTEM

METHOD AND APPARATUS FOR MANUFACTURING MAGNETORESISTIVE ELEMENT, SOFTWARE AND SYSTEM FOR CONTROLLING MANUFACTURING OF MAGNETORESISTIVE ELEMENT, SOFTWARE FOR ESTIMATING RESISTANCE VALUE OF MAGNETORESISTIVE ELEMENT, AND COMPUTER SYSTEM

机译:制造磁致电阻元件的方法和装置,控制磁致电阻元件制造的软件和系统,用于估计磁致电阻元件的电阻值的软件以及计算机系统

摘要

PROBLEM TO BE SOLVED: To provide a method and device for manufacturing a magnetic resistance effect element for reducing the fluctuation of the magnetic resistance effect element or the fluctuation of the center of distribution, and a method and device for manufacturing a magnetic head.;SOLUTION: Before the start of grinding, wafer information including each kind of factor in a wafer stage which is likely to affect the final resistance value of an MR film is obtained, and an S value is calculated by using a statistical method from the information. During the process of grinding, working time information including each kind of factor in a grinding stage which is likely to affect the final resistance value of the MR film is obtained (a step S3), and a K value is calculated by using the statistical method from the information (S4) in a fixed cycle. Then, an MR resistance estimated value during the process of grinding is calculated form the S value and the K value, and when the MR resistance estimated value reaches a target resistance value (S7), the grinding work is stopped (S8).;COPYRIGHT: (C)2001,JPO
机译:解决的问题:提供一种用于制造磁阻效应元件的方法和装置,用于减小磁阻效应元件的波动或分布中心的波动,以及用于制造磁头的方法和装置。 :在开始研磨之前,获得包括可能影响MR膜的最终电阻值的晶片阶段中的各种因素的晶片信息,并根据该信息使用统计方法来计算S值。在研磨过程中,获得包括可能影响MR膜的最终电阻值的研磨阶段中的各种因素的工作时间信息(步骤S3),并使用统计方法计算K值。从信息(S4)中以固定周期开始。然后,从S值和K值计算出研磨过程中的MR电阻估计值,并且当MR电阻估计值达到目标电阻值时(S7),停止研磨工作(S8)。 :(C)2001,日本特许厅

著录项

  • 公开/公告号SG87123A1

    专利类型

  • 公开/公告日2002-03-19

    原文格式PDF

  • 申请/专利权人 TDK CORPORATION;

    申请/专利号SG20000003362

  • 申请日2000-06-14

  • 分类号G11B5/39;B24B49/10;

  • 国家 SG

  • 入库时间 2022-08-22 00:43:14

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