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A METHOD TO REDUCE POST-DEVELOPMENT DEFECTS WITHOUT SACRIFICING THROUGHPUT
A METHOD TO REDUCE POST-DEVELOPMENT DEFECTS WITHOUT SACRIFICING THROUGHPUT
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机译:在不牺牲吞吐量的情况下减少开发后缺陷的方法
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摘要
Post-development defects in the manufacture of semiconductor devices through the use of surfactants, suchas ammonium lauryl sulfate, incorporated in the rinse water or the developer for the resist. The surfactants effectively remove resist defects in or around the resist pattern without attacking the resist itself.
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