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Dielectric material comprising Ta2O5 doped with TiO2 and devices employing same
Dielectric material comprising Ta2O5 doped with TiO2 and devices employing same
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机译:包含掺杂有TiO2的Ta2O5的介电材料和采用该介电材料的器件
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摘要
Applicant has discovered that the dielectric constant of Ta2 O5 can be significantly enhanced by the addition of small quantities of TiO2. Specifically, if Ta2 O5 is doped with more than about 3 mole percent of TiO2 the doped material will have a dielectric constant higher than the undoped material. For example, at a ratio of 0.92 Ta2 O5:0.08 TiO2, the dielectric constant is enhanced by a factor of more than three. Because both Ta and Ti are compatible with current microelectronics processing, the new dielectric can be used to make capacitors of reduced size with but minor modifications of conventional processes.
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机译:申请人发现,通过添加少量的TiO 2 Sub>可以显着提高Ta 2 Sub> O 5 Sub>的介电常数。具体地,如果Ta 2 Sub> O 5 Sub>掺杂有约3摩尔%以上的TiO 2 Sub>,则掺杂材料的介电常数将高于未掺杂的材料。例如,以0.92 Ta 2 Sub> O 5 Sub>:0.08 TiO 2 Sub>的比率,介电常数提高了三倍以上。 。因为Ta和Ti都与当前的微电子工艺兼容,所以可以使用新的电介质来制造尺寸减小的电容器,而对传统工艺进行较小的修改。
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