Surface treatment solution for polysilicon film and method of treating the surface of polysilicon film using the same

摘要

An inexpensive surface treatment solution that can selectively reduce the average roughness (Ra) of the surface of a polysilicon film formed by crystallization on an insulating substrate such as one made from glass with a laser annealing process. The surface treatment solution essentially comprises 0.01 to 0.5 wt% of hydrofluoric acid or 0.5 to 5 wt% of ammonium fluoride, 50.0 to 80.0 wt% of nitric acid and water.