Surface treatment solution for polysilicon film and method of treating the surface of polysilicon film using the same

摘要

PURPOSE: To provide an inexpensive surface processing agent which can selectively reduce the average roughness (Ra) of the surface of a polysilicon film formed on an insulated substrate consisting of a glass material by a laser annealing method. CONSTITUTION: A polysilicon film surface processing agent is substantially consisting of hydrofluoric acid of 0.01 to 0.5 mass% or ammonium fluoride of 0.5 to 5 mass%, nitric acid of 50.0 to 80.0 mass% and water.