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Method of spectrochemical analysis of impurity in gas

机译:气体中杂质的光谱化学分析方法

摘要

The invention electric current to start in, the change in laser light intensity in accordance with the increase of the injection current to the injection current to a semiconductor laser light emitting device as a semiconductor laser beam used by a saturated absorption spectroscopy method using a frequency-modulated semiconductor laser light value (B point) is the lower limit current value, and the increased current value to the change in the wavelength shift start to a minimum (C point) according to the injection current to the upper limit current value, the laser beam emitted from an injection current region therebetween to the samples to provide a method of measuring the absorption spectrum used. According to the method of the present invention, a trace amount of the impurity gas contained in the high sensitivity, can also improve the measurement precision.
机译:本发明的电流开始,激光强度随着注入电流向半导体激光发射器件的注入电流的注入电流的增加而变化,该注入是作为使用频率为-的饱和吸收光谱法使用的半导体激光束的调制的半导体激光值(B点)是下限电流值,并且随着对上限电流值的注入电流的增加,随着波长偏移的变化而增加的电流值开始最小(C点)。从它们之间的注入电流区域发射的光束到样品,以提供一种测量所用吸收光谱的方法。根据本发明的方法,高灵敏度中包含的痕量杂质气体也可以提高测量精度。

著录项

  • 公开/公告号KR100316487B1

    专利类型

  • 公开/公告日2001-12-12

    原文格式PDF

  • 申请/专利权人 NULL NULL;

    申请/专利号KR19997008855

  • 发明设计人 모리시타준이치;우샹퀴안;

    申请日1999-09-28

  • 分类号G01N21/39;

  • 国家 KR

  • 入库时间 2022-08-22 00:31:50

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