Ion beam assisted e-beam evaporator and Ion beam evaporator

摘要

PURPOSE: A method for manufacturing a transparent ITO conductive thin film on a resin-based substrate using an ion beam assisted electron-beam vacuum evaporator is provided to simplify a manufacturing process, by forming a transparent conductive layer having surface resistance of 10 to 1000 ohm and a light transmission rate of more than 80 percent. CONSTITUTION: A resin-based substrate like PMMA, polycarbonate and polyester is based on In-O, Zn-O and Sn-O. A transparent conductive layer sheet or film having sheet resistance from 10 to 1000 ohm and a light transmission rate of 80 percent regarding an ITO film sheet is manufactured at a temperature not higher than 100 deg.C by an ion beam assisted electron-beam vacuum evaporator. A transparent ITO conductive thin film is formed on the resin-based substrate.