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MULTILAYER PILLAR ARRAY CAPACITOR STRUCTURE FOR DEEP SUB-MICRON CMOS

机译:深亚微米CMOS的多层柱状阵列电容器结构

摘要

The present invention relates to a capacitor structure having an array of electrically conductive pillars forming a flat plate of a capacitor, in particular a capacitor structure used in deep submicron CMOS. Each pillar is formed by electrically conductive line segments from at least two different conductor levels electrically connected by electrically conductive vias. A dielectric material is positioned between the two conductor levels and the pillars of the array. The pillar is electrically connected in an alternating manner to the opposite node so that the pillar is electrically interdigitated.
机译:电容器结构技术领域本发明涉及一种电容器结构,其具有形成电容器的平板的导电柱的阵列,特别是在深亚微米CMOS中使用的电容器结构。每个支柱由来自至少两个不同导体层的导电线段形成,所述至少两个不同导体层通过导电通孔电连接。介电材料位于两个导体层和阵列的柱之间。立柱以交替的方式电连接到相对的节点,使得立柱被电叉指。

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