ORGANOMETALLIC COPPER COMPLEX AND PREPARATION OF COPPER THIN FILM BY CVD

摘要

PURPOSE: Provided are an organometallic copper complex and a method for preparing a copper metal thin film on a substrate by means of Chemical Vapor Deposition(CVD). CONSTITUTION: The organometallic copper complex is represented by the formula(1a), in which each of R1 and R2 independently represents an alkyl group having 1 to 8 carbon atoms or a perfluoroalkyl group having 1 to 8 carbon atoms; R3 represents a hydrogen atom, a fluorine atom, or a perfluoroalkyl group having 1 to 8 carbon atoms; and at least one of R4 through R7 represents a group of the formula(1b): in which Ra represents a linear or branched chain alkylene group having 1 to 5 carbon atoms, each of Rb, Rc, and Rd independently represents a linear or branched chain alkyl group having 1 to 5 carbon atoms, and M is an oxygen atom or a sulfur atom, and each of the remainders independently represents a hydrogen atom or a linear or branched chain alkyl group having 1 to 8 carbon atoms.