Organometallic copper complex and preparation of copper thin film by cvd

摘要

An organometallic copper complex having the following formula is favorably employable for preparing copper metal film by chemical vapor deposition: [R¹ and R² each is alkyl or perfluoroalkyl; R³ is hydrogen, fluorine, or perfluoroalkyl; and at least one of R⁴-R⁷ is a group having the formula: (in which R^a is alkylene, R^b, R^c, and R^d each is alkyl group, and M is oxygen or sulfur, and each of the remainders is hydrogen or alkyl)].