PHOTOMASK FORMING METHOD AND HEAT TREATMENT EQUIPMENT CAPABLE OF FORMING A PHOTOMASK OF HIGH DIMENSIONAL ACCURACY

摘要

Free and supplying heat to the photomask blank 4 from the lower portion of the base plate (1) disposed on the photomask blank 4 in the baking process, to correct the end face side heat of the photomask blank (4) The photomask blank and (4) in part by supplying heat to the photomask blank 4 from the end face plate (3) for the in-plane temperature distribution to be made uniform. In the cooling step after the prebaking process, the photomask blank (4) to correct the end face side radiation 15, the photomask blank (4) The photomask blank from the end surface plate (3) for the in-plane temperature distribution to be made uniform in the and partially supplied to the column 11 at a 4 to cool the photomask blank (4).