METHOD FOR PRODUCING A FREESTANDING CVD DIAMOND FILM FREE FROM CRACK AND WARPAGE

摘要

The present invention is a method for synthesizing a diamond phase on a film by chemical vapor deposition (CVD), controlling the intrinsic stress applied to the film during synthesis, selecting an optimal substrate, and cracking And a synthetic method for producing a flat diamond free film. In particular, after depositing the diamond film to a certain thickness at a certain deposition temperature, the deposition temperature during synthesis is reduced or increased continuously or in several steps to induce compressive or tensile stress on the diamond film during synthesis, thereby compressing or tensioning the diamond film. By canceling the stress, a diamond free film free of growth cracks is produced, and a flat free film free from warpage is produced using tungsten having a high modulus of elasticity as the substrate material. According to the present invention, it is possible to effectively eliminate growth cracks generated during the conventional diamond film synthesis, and to synthesize a uniform and flat diamond film without warping the film.