METHOD FOR PRODUCING CVD DIAMOND FILM SUBSTANTIALLY FREE OF THERMAL STRESS-INDUCED CRACKS

摘要

GEMAT 9/60-SD-579 Chemical vapor deposition method for producing a diamond film substantially free of thermal stress-induced cracks in which diamond growth occurs on both sides of a thin substrate so that two diamond coatings with identical opposing tensile forces are formed on each side of the substrate at a thickness greater than the thickness of the thin substrate.