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Semiconductor device and its manufacturing method, and non-destructive inspection method and non-destructive inspection equipment for non-destructive inspection

机译:半导体器件及其制造方法,用于非破坏性检查的非破坏性检查方法和非破坏性检查设备

摘要

PROBLEM TO BE SOLVED: To detect a short defect while no electrical connection is required. ;SOLUTION: A thermo-electromotive force generating structure 21 is formed in a semiconductor device wafer 40. The thermo-electromotive force generating structure 21 is connected to first layer wirings 34a and 34b which are to be inspected. If a short defect 42 is present between the wirings, a thermo- electromotive force developed when the thermo-electromotive force generating structure 21 is irradiated with a laser beam 3 allows a current to flow through the short defect 42. The magnetic field induced by the current is detected with a magnetic field detector, and the detection result is, for example, displayed in brightness on an image display device corresponding to scanning of the laser beam 3, providing a scan magnetic field image. A laser scan microscope image from a reflection light is provided at the same time, or sequentially, with the scanning of the laser beam 3, with two images displayed superimposed. From this picture, the position of the short defect 42 is specified.;COPYRIGHT: (C)2000,JPO
机译:解决的问题:在不需要电气连接的情况下检测短路故障。 ;解决方案:在半导体器件晶片40中形成热电动势产生结构21。热电动势产生结构21连接到要检查的第一层布线34a和34b。如果在布线之间存在短路缺陷42,则当用激光束3照射热电动势产生结构21时产生的热电动势使电流流过短路缺陷42。用磁场检测器检测电流,检测结果例如在与激光束3的扫描相对应的图像显示装置上以亮度显示,从而提供扫描磁场图像。来自反射光的激光扫描显微镜图像是在扫描激光束3的同时或相继提供的,其中两个图像重叠显示。从这张照片中可以确定出短路缺陷42的位置。版权所有:(C)2000,JPO

著录项

  • 公开/公告号JP3450212B2

    专利类型

  • 公开/公告日2003-09-22

    原文格式PDF

  • 申请/专利权人 NECエレクトロニクス株式会社;

    申请/专利号JP19990067744

  • 发明设计人 二川 清;

    申请日1999-03-15

  • 分类号H01L21/66;G01N27/00;G01N27/72;H01L39/22;

  • 国家 JP

  • 入库时间 2022-08-22 00:22:33

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