The film thickness measurement by inelastic electron scattering

摘要

(57) For example, summary, like carbon film of a ferromagnetic material on a substrate, a thin film having a thickness of 10nm the order of 1, formed on a substrate of other materials is distinctly different in atomic number Method and apparatus for measuring has been though the thickness. For example, the primary radiation source X-rays or an electron beam is (12) (10) causes (18) secondary electrons of low energy in the substrate. Increases in relation to the thickness generally intensity of electrons scattered inelastically (Figure 2). Were measured for Test Samples (16) secondary electron spectrum and compared with the spectrum of reference samples of the same each having components of the same set, whereby the thickness of the test is determined. This method can also be carried out in electronic conventional spectrometer by adding the program analyzes several. Various techniques for comparing the reference data and test data to extract the data is effectively utilized.