首页> 外国专利> METHOD FOR APPROXIMATING EID FUNCTION IN CHARGED PARTICLE BEAM EXPOSURE APPARATUS, METHOD FOR CORRECTING APPROXIMATION EFFECT AND METHOD FOR DECIDING RETICLE PATTERN

METHOD FOR APPROXIMATING EID FUNCTION IN CHARGED PARTICLE BEAM EXPOSURE APPARATUS, METHOD FOR CORRECTING APPROXIMATION EFFECT AND METHOD FOR DECIDING RETICLE PATTERN

机译:带电粒子束曝光设备中的Eid函数近似化方法,校正近似效果的方法和标线图案的确定方法

摘要

PROBLEM TO BE SOLVED: To provide a method for setting the parameter of the approximation function of an EID function showing the planar distribution of energy stored in a resist.;SOLUTION: (1) A plurality (N) of approximation formulas of the EID function are set up (2) to obtain similarity between an exposure pattern obtained by calculation using the approximated EID function and an exposure pattern obtained by an exposure experiment. (3) A parameter for deciding the function about a plurality (P) of approximation formulas selected randomly from among the approximated EID functions except the T-number of the EID functions of high similarity or at least one optional value selected randomly from prescribed ones among coupling coefficients of the functions with each other is varied to generate the N-number of new approximated EID functions to replace the approximated functions with varied values. (4) Operations of the (2) to (3) are repeated until the similarity is converted. Thereafter, the approximation formula of the EID function of the highest similarity is adopted as an approximation formula.;COPYRIGHT: (C)2003,JPO
机译:解决的问题:提供一种用于设置EID函数的近似函数的参数的方法,该参数表示抗蚀剂中存储的能量的平面分布。解决方案:(1)EID函数的多个(N)近似公式设置(2)来获得通过使用近似EID函数的计算获得的曝光图案与通过曝光实验获得的曝光图案之间的相似性。 (3)用于确定关于从近似EID函数的T数除高相似度的EID函数之外的随机选择的多个(P)近似公式的函数的参数或者从从其中一个的规定值中随机选择的至少一个可选值的参数函数彼此的耦合系数被改变以生成N个新的近似EID函数,以用变化的值代替近似函数。 (4)重复(2)至(3)的操作,直到转换相似度为止。此后,采用具有最高相似性的EID函数的逼近公式作为逼近公式。版权所有:(C)2003,JPO

著录项

  • 公开/公告号JP2003264140A

    专利类型

  • 公开/公告日2003-09-19

    原文格式PDF

  • 申请/专利权人 NIKON CORP;

    申请/专利号JP20020065021

  • 发明设计人 KAMIJO KOICHI;

    申请日2002-03-11

  • 分类号H01L21/027;G03F1/16;G03F7/20;

  • 国家 JP

  • 入库时间 2022-08-22 00:20:24

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